Langdao Silex Shows 15W EUV Light Source Prototype in Shanghai
The FlintNano LPP-OXXO prototype was displayed unpowered at the 26th China International Industry Fair, with 90% domestic components.
Langdao Silex demonstrated a prototype extreme ultraviolet (EUV) light source with more than 15W of output power and 90% domestically sourced components, according to tomshardware.com. The prototype was shown at the 26th China International Industry Fair in Shanghai and was not powered on during the display.
The system, called FlintNano LPP-OXXO, uses laser-produced plasma (LPP) technology. It pairs a 1,000W driving laser with an operating frequency of 1 kHz to 20 kHz, and conversion efficiency exceeds 2%. EUV output is above 15W, and brightness reaches 100 W/(mm²·sr). The source has an étendue of 1 × 10⁻³ mm²·sr and generates plasma with a diameter of 60 μm.
Langdao Silex says the FlintNano LPP-OXXO can run continuously for more than 100 hours, with plasma stability of 3% RMS and EUV output power stability of 5%. The company is also developing the FlintMicro-LPP high-power EUV source, which has completed proof-of-principle validation.
Industry context
ASML, the Dutch maker of EUV lithography equipment, introduced 250W-class EUV sources for commercial production in 2018–2019, according to TrendForce. Earlier milestones were far lower: ASML's 2007 demonstration equipment used about 10W at intermediate focus with DPP sources, and Cymer's LPP sources in early NXE:3100 systems delivered up to 11W during wafer exposure in 2012. Cymer demonstrated roughly 40W at intermediate focus over extended operating periods in 2013, the same year Japan's Gigaphoton targeted 25W with its first prototype before demonstrating 43W in early 2014 and 118W in a 10-minute test by late 2014. Early NXE:3400-series machines shipped with 125W–150W at intermediate focus sources, short of what high-volume manufacturing requires.
Langdao Silex was established in 2024 by alumni of Tsinghua University's Gas Discharge Plasma Laboratory, the company said (background, 2024).
Quick answers
What was demonstrated at the China International Industry Fair?
Langdao Silex showed its FlintNano LPP-OXXO prototype EUV light source, which has over 15W output power and 90% domestic components. It was displayed without being powered on.
What are the FlintNano LPP-OXXO's key specifications?
It uses laser-produced plasma technology with a 1,000W driving laser, 1 kHz to 20 kHz operating frequency, over 2% conversion efficiency, EUV output above 15W, brightness of 100 W/(mm²·sr), and more than 100 hours of continuous operation.
What else is Langdao Silex developing?
The company is developing the FlintMicro-LPP high-power EUV source, which has completed proof-of-principle validation.